Silicon Wafer
We offer various silicon wafers on our private-label,which are processed with our well experienced know-how. We currently supply our wafers to many makers, universities and public offices.
Silicon Wafer
Silicon wafers are high purity Si wafers which are thinly sliced from so-called ingot of cylinder single crystal.We provide silicon wafers for various applications, including dummy, monitor, and prime wafers.
Applications
Generally, large diameter wafers are used for MPUs with large chip sizes, DRAMs which require cost reduction through mass production, and flash memories. They are mostly used for the production of integrated circuits (ICs/LSIs) and other discrete devices.
Monitor Wafer
- Monitor wafers are the wafers to be used in the case that an adjustment is required in each production step prior to the actual IC production.
- Applications
- Monitor wafers are used as inexpensive substitutes for high-grade and costly prime wafers when setting various process conditions, such as checking deposition or epitaxial growth rates, or measuring equipment tolerance against variations in wafer thickness.
- Features
- We provide a comprehensive lineup of wafers ranging from 2 to 12 inches to meet a wide range of customer needs.
Our wafers deliver reliable quality that ensures satisfaction for various applications such as particle inspection and process monitoring.
Dummy Wafer
- Dummy wafers (also called as test wafers) are wafers mainly used for experiment and test and being different from general wafers for product.
Accordingly, reclaimed wafers are mostly applied as dummy wafers (test wafers). - Applications
- Dummy wafers are often used in a production device to improve safety in the beginning of production process and are used for delivery check and evaluation of process form.
As dummy wafers are often used for experiment and test, size and thickness thereof are important factors in most occasions. - Features
- We provide a comprehensive lineup of wafers ranging from 2 to 12 inches to meet a wide range of customer needs.
Our wafers deliver reliable quality that ensures satisfaction for various applications such as particle inspection and process monitoring.
Prime Wafer
- Prime wafers are strictly controlled in terms of resistivity, flatness, and particle levels, all of which are critical factors affecting device performance.
- Applications
- Prime wafers are the wafers to produce IC chips directly and are used for forming circuit pattern on the substrate and manufacturing devices.
- Features
- We mainly provide P+N+ (heavily doped) wafers, and also support custom specifications including lightly doped types.
Wafers are available in sizes ranging from 5 to 12 inches.
FZ Wafer
- The FZ (Floating Zone) method refers to a single crystal growth process that differs from the CZ (Czochralski) method.
- Applications
- The application of FZ wafers includes MEMS, diode, IGBT, RF device, thyristors(rectifier), high efficiency solar cell and optical products.
- Features
- We supply NTD wafers irradiated with neutrons and impurity-doped GDFZ silicon wafers for applications such as high-frequency devices, MEMS, and power devices.
Our products support a wide range of needs from research and development to mass production, with available wafer sizes from 5 to 8 inches.
Epi Wafer
- Epitaxial-growth means the crystal growth being conducted on crystal of substrate and disposed in accordance with foundation of substrate crystal phase.
- Applications
- Silicon epi wafers are utilized for element of diode and transistor or substrate for IC such as bipolar type and MOS type.
- Features
- We offer high-quality and custom epitaxial wafers.
| Thickness | Resistivity | |
|---|---|---|
|
N-type epitaxial Wafer |
||
| Sb・As・Phos
-doped substrate |
to 130µm | 0.01-100Ω.cm |
|
P-type epitaxial Wafer |
||
| Boron-doped
substrate |
to 130µm | 0.01-100Ω.cm |
| Special epitaxial
and multilayer |
to 150µm | to 150Ω |
Film Wafer
- Wafers processed with film deposition is called film wafer.
- Applications
- Examples of film to be used (growth of film) include isolation film as isolation material between layers, metal film as conductive material, process material such as resist and protective film.
- Features
- We offer film formation service such as metal film and thermally-oxidized film etc.(Size: 2inch ~ 12inch)
(reference example)- thermally-oxidized film, Si3N4 film, TEOS, BPSG, Cu film, Al film, Ti film, Ta film, TaN film, TiN film etc．
- For photolithography process, we can produce mask with customer's requirement and also offer patterning process with standard mask as well.
Others, Special Specification
- Features
- We provide special-specification wafers tailored for research applications, including 100 μm-thick wafers, special orientations, LM processing, and corner-chipped types.
Small-quantity orders are available, and wafer sizes and specifications can be customized upon request.